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NASA and the link between Joe Stack and John Bedell

 
Anonymous Coward
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03/11/2010 01:08 AM
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Re: NASA and the link between Joe Stack and John Bedell
Suprise bedell was in Texas in Jan 2010 where he was pulled over for speeding. His parents file missing persons report, but he returns after a week. I wonder if anyone saw the guy near Joe stack's place or if anyone knows this guy personally. I feel something is really strange about this check out cryptome there's oringinal postings of these guys and there info;09086
 Quoting: Anonymous Coward 911763


[link to cryptome.org]
Anonymous Coward
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03/11/2010 05:25 AM
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Re: NASA and the link between Joe Stack and John Bedell
omg two white dudes who millionaires got whacked over this

you know dis shit be 4 real!

holler!
Anonymous Coward
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03/12/2010 12:11 AM
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Re: NASA and the link between Joe Stack and John Bedell
bump
Anonymous Coward
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03/12/2010 12:34 AM
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Re: NASA and the link between Joe Stack and John Bedell
I hereby declare this thread alive.
Anonymous Coward
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03/12/2010 06:24 AM
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Re: NASA and the link between Joe Stack and John Bedell
They took off any info about stack and bedell there connected. If bedell was a conspiracy theorist then he should have some posts on here but I can tell you one thing is for sure this guy is smart enough not to walk up to the pentagon and start shooting. Where's the video of him walking up and shooting I'm sure the pentagon has security cameras all over. They should release it and end this suspision.
Anonymous Coward
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03/12/2010 07:04 AM
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Re: NASA and the link between Joe Stack and John Bedell
I guess this was just some more rantings of a crazy person....




[link to 74.125.155.132]


Aluminum Anodization for DNA Integrated Circuits

J. Patrick Bedell

jpb@infoeng.org
October 17, 2006

Abstract

Published research has indicated that DNA molecules can be adsorbed on the sur-face of aluminum electrodes in an electrochemical reaction. Exploitation of this phe-nomenon with aluminum structures in standard integrated circuits may enable fun-damentally new microscale and nanoscale systems based on the foundation of currentintegrated circuit technology. This proposal outlines an effort to demonstrate and char-acterize this process using a CMOS microsystem, to be fabricated using the MOSISservice, and low-cost DNA printing equipment.


1 Introduction

Molecular self-assembly is increasingly viewed as a critical enabling technology for the de-velopment of nanosystems expected to provide dramatic new benefits and radically newcapabilities to individuals. The pervasive use of integrated circuit technology in every as-pect of modern life provides motivation for the fullest possible exploitation of standard ICprocesses for the development of molecular self-assembly and molecular nanotechnology ingeneral. Specifically, this preeminence of IC technology, and complementary metal-oxide-semiconductor ICs in particular, justifies a detailed characterization and thorough under-standing of molecular adsorption processes on materials present in CMOS integrated cir-cuits, as molecular adsorption on solid surfaces is a fundamental process in the integrationof molecules and molecular systems with solid-state technology.Aluminum alloy is the primary material used to conduct electricity in CMOS integratedcircuits. It is well known that aluminum can be coated with an oxide film, in an electrochem-ical process called anodization, to alter its appearance or mechanical properties, althoughthis coating is usually performed on macroscopic aluminum objects. From the standpointof micro- and nanofabrication, the anodic aluminum oxide film itself has been the primaryfocus of contemporary research, as it forms an ordered nanoporous structure under a widerange of processing conditions[1, 2].When aluminum is anodized in an aqueous solution containing acids such as phosphoric,sulfuric, or carboxylic acid, the molecular acids are incorporated into the film, forming an1
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electrochemical bond with the oxidized aluminum atoms. This incorporation of moleculespresent in the anodizing bath is key to the modification of the appearance, and other prop-erties, of anodized aluminum. While anodization of aluminum by small-molecule acids is aroutine process, the use of macromolecular acids for aluminum anodization is largely unex-plored.Deoxyribonucleic acid is perhaps the most important example of a macromolecular acid.In the course of experiments on the manipulation of DNA molecules by time-varying electricfields generated by aluminum microelectrodes, one group has demonstrated DNA adsorptionon aluminum[3]. Their research has provided support for the hypothesis that, by applying avoltage to an aluminum microelectrode, one end of a DNA molecule can be anchored to thealuminum surface, with the other end extending from the surface. Despite the fact that thisresearch has largely been ignored in the years since it was first published, it is best perceivedas a tantalizing glimpse of opportunity.The unique molecular properties of DNA, in addition to its obvious ubiquity, make DNAmolecules a natural component of molecular self-assembly processes. The incorporation ofDNA molecules into CMOS integrated circuits, using aluminum anodization, potentiallypresents the opportunity to use standard IC technology as the foundation for complex self-assembled nanosystems.In the following, we propose an effort to characterize DNA adsorption on aluminummicroelectrodes. The proposed research is focused on the design, fabrication, operation,and physical analysis of a CMOS microsystem for performing anodization and controllinghybridization with microelectrode arrays.After a more detailed description of the evidence for DNA adsorption on aluminum, weprovide further motivation for the proposed research by briefly describing some applicationsof DNA hybridization on standard integrated circuits. This is followed by a description ofthe CMOS microsystem to be created for the performance of the proposed research, alongwith a description of the fluidic system necessary for performing electrochemical processing,using DNA solutions, on the surface of the proposed CMOS microsystem.2 Prior Work and Future Possibilities2.1 DNA manipulation by Al microelectrodesOne early effort to manipulate cells and molecules using microfabricated electrodes[4], calledthe fluidic integrated circuit by its creators, used aluminum evaporated onto glass and pat-terned to form electrodes, which created an electric field when a voltage was applied to theopposing electrodes (see Figure 1). In the presence of a spatially nonuniform electric field,polarizable cells and molecules experience a force in the direction of increasing electric fieldmagnitude, a phenomenon called dielectrophoresis[5]. During experiments to characterize theresponse of DNA molecules, 48.5kbp (kilo base pairs) in length, to intense (approximately1MV/m) AC (1MHz) electric fields[6, 7], it was discovered that DNA molecules, which havea random coil conformation in solution, are stretched straight along the field lines. It was2
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also observed that the stretched DNA molecules rapidly migrated to the region of highestfield strength by dielectrophoresis, until one end of the stretched molecule contacted thesurface of the aluminum electrode. Using fluorescent DNA labels, it was determined that,while one end was anchored at the surface of the electrode, the rest of the molecule extendedinto the solution. Later investigations used atomic force microscopy to confirm that DNAmolecules were adsorbed on the surface of the electrodes[8].1 MV/m, 1 MHzFigure 1: Early demonstration of DNA-aluminum adsorption: Aluminum electrodes evapo-rated onto a glass cover slip, with an interelectrode spacing of 80 microns. When a 1MHzAC voltage is applied to the electrodes to create an electric field of approximately 1MV/m,DNA molecules (solid lines between electrodes) rapidly migrate to the highest-field regionand attach to the electrode surfaces.While these investigations were important in understanding the interaction of DNA withaluminum, they did not address several questions relevant to the practical application ofDNA adsorption on aluminum. Specifically:• how does the process depend on the applied voltage and frequency? In previous studies,a peak-to-peak voltage of 80V was applied to electrodes spaced 80µm apart, for anelectric field of 1MV/m. Not addressed was the effect of smaller electrode separationor smaller applied voltage. Similarly, the applied frequency was 1MHz for all of theexperiments performed. The effect on adsorption of varying the electric field frequencywas not addressed.• how does the process depend on the length of DNA molecule used? The only molecule3
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used for these studies was λ-phage DNA, with a length of 48.5 kbp. Many applica-tions use DNA molecules significantly smaller than this, such as cDNA microarraysin which the molecular lengths are on the order of several thousand bp or fewer, andoligonucleotide arrays which are on the order of tens of base pairs. Previous studies ofthiolated DNA adsorption on gold[9] have shown that surface coverage is affected byDNA sequence length.• what is the long-term stability of adsorbed DNA on aluminum? The long-term stabilityof aluminum interconnect in integrated circuits is an important concern[10], and deviceapplications of DNA adsorption must address this issue.• what is the microstructure of the interaction between the adsorbed DNA moleculesand the aluminum surface?2.2 Future PossibilitiesAn obvious application for adsorbed DNA molecules on the surface of an integrated circuit ismicropositioning of objects for heterogeneous integration[11]. In this process, a surface usedas the platform for integration has single stranded DNA molecules adsorbed at one or morelocations, and the objects to be placed on the surface have complementary single strandedDNA molecules attached. By controlling the placement and sequence of DNA moleculeson the surface and on the objects to be placed, it is possible to use the hybridization ofcomplementary DNA molecules to self-assemble the components into the desired finishedproduct.One of the most important applications of heterogeneous integration is the Smart Dustproject[12]. Smart Dust motes are projected to be systems, on the order of 1 cubic millimeterin size, with self-contained sensing, computation, and communication capabilities. A keycomponent of Smart Dust systems is CMOS integrated circuits, along with microfabricatedoptical and mechanical components. The use of DNA-based self-assembly to manufactureSmart Dust motes may contribute to large-scale, low-cost production processes that enableSmart Dust to reach its full potential.Another important phenomenon that may be demonstrated with DNA adsorbed to alu-minum is electronic control of DNA hybridization[13, 14]. This process, illustrated in Figure2, occurs when a double stranded DNA molecule is exposed to an electric field and a singlestrand of the molecule is attached to a surface (generally the surface of the electrode gen-erating the electric field). By controlling the applied electric field, the single stranded DNAnot adsorbed to the surface can be dissociated from the complementary adsorbed ssDNA.The magnitude of the electric field necessary to cause two ssDNA molecules to dissociatecan also indicate whether there are base pair mismatches between the molecules, a fact thatis relevant to the diagnosis of genetic disorders.4
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EA)B)Figure 2: Electronic control of DNA hybridization: (A) Complementary single-strandedDNA molecules form a double-stranded DNA molecule, with one of the strands adsorbed onthe surface of an electrode. (B) By applying a voltage to the electrode, an electric field iscreated, which forces the negatively charged non-adsorbed ssDNA from the electrode.3 Research PlanThe goal of the proposed research is the demonstration, characterization, and optimization ofDNA adsorption on aluminum, in order to effectively utilize this phenomenon in commercialintegrated circuit systems. In order to accomplish this, it may be necessary to conduct a largenumber of experiments with varying parameters (voltage, frequency, temperature, solutioncomposition, etc.). Because the experiments, if successful, entail surface modifications tothe aluminum microelectrodes to be used, it will be necessary to have a large number of themicroelectrodes for one-time experiments and subsequent analysis.The need for large numbers of test structures, and the imperative to apply this research tocommercial systems, indicates that the use of CMOS technology to fabricate the microsystem,instead of custom microfabrication processes, is warranted. The feature sizes achievablewith CMOS are smaller than those achievable by all but the most specialized and expensivecustom microfabrication processes. The availability of active circuitry and transducers inCMOS processes creates the opportunity to integrate a wide variety of capabilities on thefinished chip. As well, the use of foundry CMOS increases the relevance of the proposedresearch to contemporary integrated circuit manufacturing, enhancing the likelihood that5
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this research will be adopted for use in commercial systems.3.1 CMOS microsystemFor specific discussion of the CMOS process to be used, we refer to the Taiwan SemiconductorManufacturing Corporation TSMC35 P2 process[15], available from MOSIS. This processhas two polysilicon layers and up to four metal layers available, with a minimum transistorlength of .35 microns. In this process, chemical-mechanical planarization is used to createflat surfaces for deposition and patterning of thin film layers.For the creation of the proposed microsystem, the fundamental structure is the aluminummicroelectrode. In order to exploit the small feature size possible with CMOS fabrication,the exposed surface of the electrode is 1 micron square. Directly underneath the squareelectrode is a “via”, connecting the top layer of metal (metal-4) with the lower level ofmetal (metal-3). Sixteen microelectrodes are arranged on the perimeter of a square 9µm oneach side to form an electrode array, with the individual microelectrodes separated by .6µm(Figure 3). While there is generally a thick “overglass” layer present on the surface of aCMOS integrated circuit to protect the circuitry from mechanical damage, the need to havethe microelectrodes exposed will require the overglass layer to be removed from the vicinityof the microelectrode array[16].Conceptually, the simplest scenario for performing anodization on the surface of thismicroelectrode array is, while the surface is exposed to an aqueous solution containing DNAmolecules, to set 15 of the microelectrodes to the ground voltage, and set the microelectrodeto be anodized (the so-called “working electrode”) at the positive supply voltage, referred toas VDD. Given the variation of DNA dynamics with frequency in an AC electric field[4], itmay be necessary to cycle the working electrode between VDD and ground at an appropriatefrequency. Controlling the voltages applied to the microelectrodes in the array can easily beaccomplished with CMOS digital circuits incorporated into the microsystem.Determining the VDD necessary for effecting anodization is a critical goal of the proposedresearch. The standard reduction potential for the conversion of Al to Al3+ is -1.676V[17].This indicates that, in order to effect the electrochemical reaction of anodization, the appliedinterelectrode voltage must be greater than 1.676V. The magnitude of the necessary addi-tional voltage is determined by the current flow in the solution, and the associated Ohmicvoltage drop.The most straightforward way to adjust the voltage used for anodization is to adjustVDD. While the maximum voltage that can be used in this TSMC process with standarddesign techniques is 5.0V, and the preferable maximum voltage is 3.3V, it is possible todesign circuits that will operate correctly at lower supply voltages. When electronicallycontrolling DNA hybridization on the surface of the microsystem, it is important to avoidelectrochemical reactions at the aluminum surface. Because scaling VDD is expected tobe the most economical way to achieve low voltages for hybridization, the circuits usedto control the microelectrode array will be engineered to function consistently at supplyvoltages between 1.0V and 3.3V. Achieving this objective will require low-voltage CMOScircuit design techniques[18] that are critical to the design of portable and power-sensitive6
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systems.The size of the microelectrode array, including the circuitry necessary to control anindividual array, is anticipated to be less than (250µm)2. This will make it possible tointegrate a sizable number of microelectrode arrays in the CMOS microsystem, in an array-of-arrays system. To effectively utilize the arrayed microelectrodes, it will be necessaryto integrate control circuitry into the microsystem to enable input signals to be directedto the appropriate microelectrode array for anodization or hybridization. To simplify thistask, a hierarchical approach to system design will be taken. Specifications will be preparedoutlining the performance requirements for the array-level circuitry, system control circuitry,and input/output circuitry, as well as the interfaces between each level. Proceeding fromthis system specification, the system will be designed and thoroughly simulated to ensurecorrect operation.3.2 Integrated processing systemThe CMOS microsystem is the primary platform for the proposed research, but it is onlyone component of the system necessary to perform anodization. Development of a systemto coordinate microelectrode voltages with fluid deposition and removal will be essential tothe success of the proposed research. At the same time, it is important to minimize thecomplexity of the processing system in order to successfully complete the initial researchproposed here.The deposition system needed for the proposed research has many features in commonwith systems for DNA microarray fabrication[19]. An important difference, however, is therequirement in this case to remove nonspecifically adsorbed DNA molecules before eachdeposition step. While it is not necessary to remove nonadsorbed DNA molecules if the goalis to simply demonstrate DNA adsorption on aluminum, for applications of this process itmay be necessary to carefully control the DNA molecules present at each microelectrode.Due to the vulnerability of the exposed microelectrodes to mechanical damage, onlynoncontact deposition methods are practical in this case. The most cost-effective deposi-tion system in this case is likely to be an inkjet printing system, adapted to use solutionscontaining DNA molecules instead of conventional inks[20, 21].A long-term goal for the proposed system is to have a controllable number of DNAmolecules of specific sequence on each microelectrode, fabricated in a process that is asrapid as possible. The objective of the current work will be the development of an econom-ical system that balances the short-term need to quickly and inexpensively perform a largenumber of experiments with the anticipated long-term need for a specialized and powerfulsystem for large-scale manufacturing.3.3 Microsystem physical analysisAtomic force microscopy is expected to be the primary tool for determining the effects of theelectrochemical processes at the aluminum electrodes. Due to the extremely small size of themicroelectrodes, other techniques for surface analysis, such as surface plasmon resonance and7
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X-ray spectroscopy, are not likely to be applicable to the analysis of individual microelec-trodes. Fluorescence microscopy will be used to analyze the hybridization of DNA molecules.Other optical techniques may be applicable to the study of the processed microsystem.4 ConclusionThe anodization of aluminum by DNA is an almost entirely unexplored process that mayhave significant applications in future integrated circuit systems. This proposal has outlineda possible first step toward the characterization of this process, but much remains to be doneto realize the potential of DNA integrated circuits.References[1] Hideki Masuda, Kouichi Yada, and Atsushi Osaka. Self-ordering of cell configurationof anodic porous alumina with large-size pores in phosphoric acid solution. JapaneseJournal of Applied Physics, 37:L1340 – L1342, 1998.[2] A. P. Li, F. Müller, A. Birner, D. Nielsch, and U. Gösele. Hexagonal pore arrays witha 50-420 nm interpore distance formed by self-organization in anodic alumina. Journalof Applied Physics, 84:6023 – 6026, 1998.[3] Masanori Ueda, Hiroshi Iwasaki, Osamu Kurosawa, and Masao Washizu. Atomic forcemicroscopy observation of deoxyribonucleic acid stretched and anchored onto aluminumelectrodes. Japanese Journal of Applied Physics, 38:2118 – 2119, 1999.[4] Masao Washizu and Osamu Kurosawa. Electrostatic manipulation of DNA in micro-fabricated structures. IEEE Transactions on Industry Applications, 26:1165 – 1172,1990.[5] H. A. Pohl. Dielectrophoresis. Cambridge University Press, Cambridge, 1978.[6] Masao Washizu, Seiichi Suzuki, Osamu Kurosawa, Takeshi Nishizaka, and Tsuneo Shi-nohara. Molecular dielectrophoresis of biopolymers. IEEE Transactions on IndustryApplications, 30:835 – 843, 1994.[7] Masao Washizu, Osamu Kurosawa, Ichiro Arai, Seiichi Suzuki, and Nobuo Shimamoto.Applications of electrostatic stretch-and-postioning of DNA. IEEE Transactions onIndustry Applications, 31:447 – 456, 1995.[8] Masanori Ueda, Yoshinobu Baba, Hiroshi Iwasaki, Osamu Kurosawa, and MasaoWashizu. Direct observation of deoxyribonucleic acid anchored between an aluminumelectrode and an atomic force microscope cantilever. Japanese Journal of AppliedPhysics, 38:6568 – 6569, 1999.8
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[9] A. B. Steel, R. L. Levicky, T. M. Herne, and M. J. Tarlov. Immobilization of nucleicacids at solid surfaces: Effect of oligonucleotide length on layer assembly. BiophysicalJournal, 79:975 – 981, 2000.[10] A.J. Griffin, F.R. Brotzen, J.W. McPherson, and C.F. Dunn. Corrosion susceptibilityof thin-film metallizations. 30th Annual Proceedings of the International ReliabilityPhysics Symposium, 1992, pages 239–246. IEEE, 1992.[11] Sadik C. Esener, Daniel Hartmann, Michael J. Heller, and Jeffrey M. Cable. DNA-assisted microassembly: a hetrogeneous integration technology for optoelectronics. Pro-ceedings of the SPIE - Heterogeneous Integration: Systems on a Chip, pages 113–140.SPIE, 1998.[12] B. Warneke, M. Last, B. Liebowitz, and K.S.J. Pister. Smart dust: communicatingwith a cubic-millimeter computer. Computer, 34:44–51, 2001.[13] Ronald G. Sosnowski, Eugene Tu, William F. Butler, James P. O’Connell, andMichael J. Heller. Rapid determination of single base mismatch mutations in DNAhybrids by direct electric field control. Proc. Natl. Acad. Sci. USA, 94:1119–1123, 1997.[14] Carl F. Edman, Daniel E. Raymond, David J. Wu, Eugene Tu, Ronald G. Sosnowski,William F. Butler, Michael Nerenberg, and Michael J. Heller. Electric field directednucleic acid hybridization on microchips. Nucleic Acids Research, 25:4907–4914, 1997.[15] Accessed from the Internet on 28 December 2003 at [link to www.mosis.org] B. Warneke and K.S.J. Pister. In situ characterization of CMOS post-process micro-machining. Proceedings of the Thirteenth Annual International Conference on MicroElectro Mechanical Systems (MEMS 2000), pages 614 – 618. IEEE, 2000.[17] Accessed from the Internet on 29 December 2003 at [link to www.webelements.com] C. Piguet. Low-power and low-voltage CMOS digital design. Microelectronic Eng.,39:179 – 208, 1997.[19] M. J. Heller. DNA microarray technology: devices, systems, and applications. AnnualReview of Biomedical Engineering, 4:129–153, 2002.[20] T. Goldmann and J. S. Gonzalez. DNA-printing: utilization of a standard inkjet printerfor the transfer of nucleic acids to solid supports. J. Biochem. Biophys. Methods, 42:105– 110, 2000.[21] T. Okamoto, T. Suzuki, and N. Yamamoto. Microarray fabrication with covalent at-tachment of DNA using bubble jet technology. Nature Biotechnology, 18:438–441, 2000.9
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ABCDEB)A)Figure 3: Diagram of the microelectrode array: (A) Plan view of microelectrode array,showing 1 µm square microelectrodes, with centered vias, arranged about the perimeter of a9 micron square. (B) A cross-section view from the dotted line in A with labeled dimensions.A: 1µm wide metal-4. B: .6µm interelectrode spacing. C: .5µm via width. D: .9µm metal-3width. E: .7µm separation between metal-3 interconnect.10
Anonymous Coward
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03/12/2010 01:01 PM
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Re: NASA and the link between Joe Stack and John Bedell
Oh and funny how joe's house burnt down I guess the evidence went wit it
Juliett 484

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03/12/2010 04:18 PM
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Re: NASA and the link between Joe Stack and John Bedell
Where is the evidence that either man was present during the events their names are connected to... ?

So far I can find zero tangible evidence that either one was present at their respective crime scenes.
Anonymous Coward
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03/12/2010 04:52 PM
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bump
Anonymous Coward
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03/12/2010 06:24 PM
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bump
Disaster Man

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03/12/2010 09:58 PM
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O.K weird don't know if this has been posted already but
on the "Many of you are close" thread I found this quote from the NASA person

you're welcome. I've actually said about as much as I can. For us, we are fortunate to have a small place between Houston and Dallas with a few acres. We have a well - hand well and wind mill. I have tools and can work with my hands. I have a few solar panels just to charge some batteries for small conveniences like small led lights at night. Forget much more than that. We have seeds for only a few basic veggies. Think about living in the late 1800's for a while and you'll be on my line of thinking. Is it enough or will it work - I don't know. How soon may it be needed? I don't know and I think anybody who says they do know is pulling our legs - UNTIL about 30-40 hours before it happens. Will an announcement be made? I don't know but I don't think so - too many variables and too much communication to be done with critical agencies to at least TRY to save some stuff. How fast am I working on this? I have been for a year and am nearly finished with what I have 'planned' to try to get together.

Thread: All I can say is, many of you are close !!!! (Page 41) about midway down now I don't know but maybe this machine exists?
Marty McFly- Oh This Is heavy Doc
Doc Bown- There's that word again, heavy. Why are things so heavy in the future, is there a problem with the earth's gravitational pole??- Back To the Future

Me-Hehe, Doc you don't have any idea do you?

All in fractals friends!


Life is like a ride at an amusement park and when you go on it you think it's real cause that's how powerful our minds are.- Bill Hicks

Either get busy living, or get busy dying- Morgan Freeman (Shawshank Redemption)
Anonymous Coward
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03/13/2010 05:14 AM
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For the slueths:THE EMPERORS NEW MIND (Kento would have loved this)
Anonymous Coward
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03/13/2010 08:43 AM
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Ok guys,
Interesting thread. Nice to see these links between Bedell and Stack (even if they are just ghosts now).

A fellow investigator and myself called BULLSHIT on the Bedell case, so we looked into it immediately after the Pentagon incident.

Here's what we found (in a nutshell)...

Bedell went to SJSU, which has ROTC, behavioral sciences, CIA information and recruitment classes... [link to events.sjsu.edu]

SJSU Class catalogue... [link to info.sjsu.edu]

And of course we have Bedell's 2004 DARPA proposal... [link to openinsurgent.googlecode.com]

Bedell also ran a company called DNAputer INC, which hailed from Richardson, Texas (while Bedell was doing much of his work from Austin)... [link to www.commandprompt.com] (side note: while running DNAputer, Bedell was apparently the sole employee with some kind of granted salary. His DARPA proposal was rejected, but he got money somehow, because his company didn't seem to produce much more than some DARPA research and an expired URL. His site register expired in 2005, I believe).

Bedell's company was seated very close to BAE systems, yet another spook outfit that works with big contracts via DOD.

Everywhere this Bedell kid went, so went the spooks and spookery. Good luck with all that info. Hope it helps some of ya in your detective work.
Anonymous Coward
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03/13/2010 01:48 PM
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Bumpy bump bump
Anonymous Coward
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03/14/2010 04:03 AM
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Re: NASA and the link between Joe Stack and John Bedell
BUMP BUMP BA BUMP BUMP

BUMP BUMP

bump
Anonymous Coward
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03/14/2010 04:10 AM
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I won't forget this thread
Juliett 484

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03/14/2010 12:56 PM
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Re: NASA and the link between Joe Stack and John Bedell
Where is the evidence that either man was present during the events their names are connected to... ?

So far I can find zero tangible evidence that either one was present at their respective crime scenes.
 Quoting: Juliett 484


Now we know "Bedell's" gun and the Las Vegas court house shooter BOTH used guns that were once seized in criminal cases in Memphis TN???


FFS...

what would be the odds of that happening if these were just random lone gunmen...

they are getting really sloppy.
Anonymous Coward
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03/16/2010 06:49 AM
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Re: NASA and the link between Joe Stack and John Bedell
Sir, it appears that my friend Karl was correct? Have you been following the election? The key to the entire race is a fog of confusion with the misdirection of a magician. A people's race? History of the United States refutes thiz inn.
Anonymous Coward
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03/16/2010 06:57 AM
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I'm afraid the clock is off. It is 2:58.

We are here plunged in politics funnier than words can express. Very great issues are involved, but the amusing thing is that no one talks about real interests. By common consent they agree to let those alone. We are afraid to discuss them. Instead of this the press is engaged in a most amusing dispute whether Mr. Cleveland had an illegitimate child and did or did not live with more than one mistress.

As for Karl, he is gone, but perhaps correct.
Anonymous Coward
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03/30/2010 12:24 AM
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Re: NASA and the link between Joe Stack and John Bedell
bumpity
ForAllMankind

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03/30/2010 12:29 AM
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Re: NASA and the link between Joe Stack and John Bedell
I'm afraid the clock is off. It is 2:58.

We are here plunged in politics funnier than words can express. Very great issues are involved, but the amusing thing is that no one talks about real interests. By common consent they agree to let those alone. We are afraid to discuss them. Instead of this the press is engaged in a most amusing dispute whether Mr. Cleveland had an illegitimate child and did or did not live with more than one mistress.

As for Karl, he is gone, but perhaps correct.
 Quoting: Anonymous Coward 803615


interesting to bump this now. this post was from the original guy who wrote the post. Who on Earth is Karl? and why is he saying the clock is off? Excuse me, original poster, but what were you talking about 14 days ago?
Anonymous Coward
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05/04/2010 11:40 PM
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bump
long duration echoes
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05/05/2010 01:57 AM
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This is the second time this has been posted.
LOCK STEP is was an SCI Program that spun out of some early studies at NASA Glen Research Center in the Mid 50's
Trajectory anomaly's in several launches pointed to a torsional aspect previously unknown to astrophysicist.
Explorer One and Echo One both exhibited statistical variations from the nominal launch profiles expected and a small study group including WVB was tasked with coming up with an answer. The trajectory deviations and the LDE's (long duration echoes) offered a tantalizing hint of a new physics model WVB eventually left the study group to concentrate on Appollo. WVB did not leave without making a contribution that would change Americas history. [link to www.enterprisemission.com]

The proof of project LOCK STEP *1960-1985 rests in a single line item in the congressional budget report published by mistake in 1985.*after 85 its assumed the program name was changed or folded in to another DARPA or NRO shell
Tangible proof exists in certain financial markets with leading firms who are tied to the Defence Department who are occaisonally provided with s DIAMINTTEL reports. The reports are very simple single sheet usually about 3 lines only.
It has allowed certain company's the opportunity to profit by reading the market and truly trade the futures.
DIAMINTTEL pronounced Dee Mint L stands for Dimensional Intelligence Trans Temporal Echo Location
Aaron Cohen, an engineer who worked on the spacecraft used in the Apollo moon program and who later, as director of the Johnson Space Center, helped NASA recover after the Challenger explosion, died Feb. 25 at his home in College Station, Tex. He was 79.
Anonymous Coward
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United States
05/05/2010 02:17 AM
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Re: NASA and the link between Joe Stack and John Bedell
Yeah right that was a good movie.
Anonymous Coward
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05/05/2010 02:17 AM
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Re: NASA and the link between Joe Stack and John Bedell
I won't forget this thread
 Quoting: Anonymous Coward 915241


Me neither.
Anonymous Coward
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05/05/2010 02:32 AM
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Re: NASA and the link between Joe Stack and John Bedell
I can truley beleive that this goes on and that it goes on at the two NSA bases, one at Menwith Hill, Harrogate, UK and it's sister base Pine Gap, Australia.
Both bases house American workers that live on and outside the bases. All workers and people who are envolved are swarn to secrecy before, while and after they carry out their contracted work.
Check out the facilities on Google maps by entering the names mentioned above.
I know each site has vast Data Centres which must be used to compile the data gathered to see 27 hours into the future.
The official role that's pumped into the sheeple is that it's a listening station for world communications (spy base) but as time goes by more and more evidence points to something much more than a spy base!
Anonymous Coward
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05/05/2010 03:34 AM
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Re: NASA and the link between Joe Stack and John Bedell
I'm afraid the clock is off. It is 2:58.

We are here plunged in politics funnier than words can express. Very great issues are involved, but the amusing thing is that no one talks about real interests. By common consent they agree to let those alone. We are afraid to discuss them. Instead of this the press is engaged in a most amusing dispute whether Mr. Cleveland had an illegitimate child and did or did not live with more than one mistress.

As for Karl, he is gone, but perhaps correct.
 Quoting: Anonymous Coward 803615


Is this the last time OP posted something?? And does anyone know what he was talking about?
Night Sky
User ID: 963801
Canada
05/07/2010 12:49 PM
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Re: NASA and the link between Joe Stack and John Bedell
I'm afraid the clock is off. It is 2:58.

We are here plunged in politics funnier than words can express. Very great issues are involved, but the amusing thing is that no one talks about real interests. By common consent they agree to let those alone. We are afraid to discuss them. Instead of this the press is engaged in a most amusing dispute whether Mr. Cleveland had an illegitimate child and did or did not live with more than one mistress.

As for Karl, he is gone, but perhaps correct.


Is this the last time OP posted something?? And does anyone know what he was talking about?
 Quoting: Anonymous Coward 961479



??? I was just reading this thread last night (May 6, 2010), this thread was started around May 4, 2010 now the dates are saying March? Did I miss something?


wtf
Night Sky
User ID: 963801
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05/07/2010 03:14 PM
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Re: NASA and the link between Joe Stack and John Bedell
I must have miss-read the dates :o( This was a good story though. LOL
ShadowDancer

User ID: 287857
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05/11/2010 06:43 PM

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Re: NASA and the link between Joe Stack and John Bedell
bump for interest
************************************
fortitudo et spes
************************************

When Japan happened I responded: "The Excrement Has Impacted the Rotary Oscillator." and clearly it has.
Thread: The Excrement Is Striking the Rotary Oscillator
+++++++++++++++++++++++++++++++++++++
"Ego et Dominus sumus amici"
+++++++++++++++++++++++++++++++++++++
Ego et mea umbra
+++++++++++++++++++++++++++++++++++++

'Man does not have the right to develop his own mind. This kind of liberal orientation has great appeal. We must electrically control the brain. Some day armies and generals will be controlled by electric stimulation of the brain.’
- U.S. government mind manipulator, Dr. Jose Delgado, Congressional Record, No. 262E, Vol. 118, 1974
^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^
Realeyesrealizereal​lies. C.

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